COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME

Provided is a compound represented by the chemical formula 1, which is non-polymeric. In the chemical formula 1, X is a group having a valency of r, each R^1 is independently an organic group containing an acid-labile group, m is an integer greater than or equal to 1, k is an integer from 1 to 5, r...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	AQAD EMAD, PARK JONG KEUN, LEE CHOONG BONG, CUI LI, CEN YINJIE, HOELZEL CONNER A, COLEY SUZANNE M, CAMERON JAMES F
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	Provided is a compound represented by the chemical formula 1, which is non-polymeric. In the chemical formula 1, X is a group having a valency of r, each R^1 is independently an organic group containing an acid-labile group, m is an integer greater than or equal to 1, k is an integer from 1 to 5, r is an integer from 2 to 10, and Ar^1, L^1, L^2, R^2, and R^3 are as defined herein. 비-중합체성인, 화학식 1로 나타낸 화합물이 제공된다: [화학식 1] JPEGpat00161.jpg4094 식 중, X는 r의 원자가를 갖는 기이고; 각각의 R1은 독립적으로 산-불안정성 기를 포함하는 유기 기이고; m은 1 이상의 정수이고; k는 1 내지 5의 정수이고; r은 2 내지 10의 정수이며, Ar1, L1, L2, R2 및 R3은 본원에 정의된 바와 같다.