Ceramic ring for semiconductor etching process and manufacturing method thereof
The present invention relates to a retaining ring for a semiconductor manufacturing process including a first ring portion formed of a first material and a second ring portion formed of a second material. The first material is formed of synthetic quartz. The second material is formed of a material w...
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | The present invention relates to a retaining ring for a semiconductor manufacturing process including a first ring portion formed of a first material and a second ring portion formed of a second material. The first material is formed of synthetic quartz. The second material is formed of a material with a higher etch resistance feature than the first material.
본 발명은 제1 소재로 형성된 제1 링 부분과 제2 소재로 형성된 제2 링 부분을 포함하는 반도체 제조공정용 유지링에 관한 것으로서, 제1 소재는 합성쿼츠로 형성되고, 제2 소재는 상기 제1 소재보다 내식각성이 높은 소재로 형성되는 것을 특징으로 한다. |
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