Vertical Type Semiconductor Thermal Process Apparatus

The present invention relates to a vertical semiconductor heat treatment device. The vertical semiconductor heat treatment device comprises: a process module including a vertical quartz tube, a plurality of wafer boats, and a lifting device; and a wafer transfer module having one or more robot arms. Therefore, the vertical semiconductor heat treatment device can minimize particle contamination, reduce a usage amount of various process gases, and quickly lower a temperature of the process module, thereby increasing productivity in processing semiconductor wafers. 수직형 반도체 열처리 장치가 개시된다. 본 발명에 따르면 웨이퍼 이송 로봇이 차지하는 공간의 비효율성을 없애기 위한 장치와 그 구성들이 설명된다.