NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION CURED PRODUCT AND METHOD OF MANUFACTURING PATTERNED CURED PRODUCT
The present invention is to provide a negative photosensitive resin composition that has a high refractive index and can form a patterned cured film having a convex lens shape, a cured product of the negative photosensitive resin composition, and a method for producing a cured product using the nega...
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| creator | HIKIDA JIRO FURUYA KAZUYUKI |
| description | The present invention is to provide a negative photosensitive resin composition that has a high refractive index and can form a patterned cured film having a convex lens shape, a cured product of the negative photosensitive resin composition, and a method for producing a cured product using the negative photosensitive resin composition. The negative photosensitive resin composition contains a resin of a specific structure (A), a photopolymerization initiator (C), and a compound of a specific structure (D), the cured product of the negative photosensitive resin composition, and the method for producing the patterned cured film using the negative photosensitive resin composition.
[과제] 높은 굴절률을 갖고, 또한 볼록 렌즈 형상을 가지는 패턴화된 경화막을 형성할 수 있는 네거티브형 감광성 수지 조성물, 당해 네거티브형 감광성 수지 조성물의 경화물, 및, 전술의 네거티브형 감광성 수지 조성물을 이용하는 경화물의 제조 방법을 제공하는 것. [해결 수단] 특정 구조의 수지(A)와, 광 중합 개시제(C)와, 특정 구조의 화합물(D)을 포함하는 네거티브형 감광성 수지 조성물, 당해 네거티브형 감광성 수지 조성물의 경화물, 및, 전술의 네거티브형 감광성 수지 조성물을 이용하는 패턴화된 경화막의 제조 방법. |
| format | Patent |
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[과제] 높은 굴절률을 갖고, 또한 볼록 렌즈 형상을 가지는 패턴화된 경화막을 형성할 수 있는 네거티브형 감광성 수지 조성물, 당해 네거티브형 감광성 수지 조성물의 경화물, 및, 전술의 네거티브형 감광성 수지 조성물을 이용하는 경화물의 제조 방법을 제공하는 것. [해결 수단] 특정 구조의 수지(A)와, 광 중합 개시제(C)와, 특정 구조의 화합물(D)을 포함하는 네거티브형 감광성 수지 조성물, 당해 네거티브형 감광성 수지 조성물의 경화물, 및, 전술의 네거티브형 감광성 수지 조성물을 이용하는 패턴화된 경화막의 제조 방법.</description><language>eng ; kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231116&DB=EPODOC&CC=KR&NR=20230157264A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20231116&DB=EPODOC&CC=KR&NR=20230157264A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HIKIDA JIRO</creatorcontrib><creatorcontrib>FURUYA KAZUYUKI</creatorcontrib><title>NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION CURED PRODUCT AND METHOD OF MANUFACTURING PATTERNED CURED PRODUCT</title><description>The present invention is to provide a negative photosensitive resin composition that has a high refractive index and can form a patterned cured film having a convex lens shape, a cured product of the negative photosensitive resin composition, and a method for producing a cured product using the negative photosensitive resin composition. The negative photosensitive resin composition contains a resin of a specific structure (A), a photopolymerization initiator (C), and a compound of a specific structure (D), the cured product of the negative photosensitive resin composition, and the method for producing the patterned cured film using the negative photosensitive resin composition.
[과제] 높은 굴절률을 갖고, 또한 볼록 렌즈 형상을 가지는 패턴화된 경화막을 형성할 수 있는 네거티브형 감광성 수지 조성물, 당해 네거티브형 감광성 수지 조성물의 경화물, 및, 전술의 네거티브형 감광성 수지 조성물을 이용하는 경화물의 제조 방법을 제공하는 것. [해결 수단] 특정 구조의 수지(A)와, 광 중합 개시제(C)와, 특정 구조의 화합물(D)을 포함하는 네거티브형 감광성 수지 조성물, 당해 네거티브형 감광성 수지 조성물의 경화물, 및, 전술의 네거티브형 감광성 수지 조성물을 이용하는 패턴화된 경화막의 제조 방법.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7sKwkAQRdNYiPoPA9aBmPiol91Jskhmls2sYBWCrJVoIP4_JmBjZ3UPh3OXyUBYKbEXTOXqEFzNwi1Sa2cHHltLoLlxPBueOHg04DyboAUUGWhQajbAJTSKQqm0BG-pAqdE0NNU_3zWyeLeP8a4-e4q2ZYouk7j8OriOPS3-Izv7uzzLC-y3eGUH_eq-K_6ACZIOVo</recordid><startdate>20231116</startdate><enddate>20231116</enddate><creator>HIKIDA JIRO</creator><creator>FURUYA KAZUYUKI</creator><scope>EVB</scope></search><sort><creationdate>20231116</creationdate><title>NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION CURED PRODUCT AND METHOD OF MANUFACTURING PATTERNED CURED PRODUCT</title><author>HIKIDA JIRO ; FURUYA KAZUYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230157264A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>HIKIDA JIRO</creatorcontrib><creatorcontrib>FURUYA KAZUYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HIKIDA JIRO</au><au>FURUYA KAZUYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION CURED PRODUCT AND METHOD OF MANUFACTURING PATTERNED CURED PRODUCT</title><date>2023-11-16</date><risdate>2023</risdate><abstract>The present invention is to provide a negative photosensitive resin composition that has a high refractive index and can form a patterned cured film having a convex lens shape, a cured product of the negative photosensitive resin composition, and a method for producing a cured product using the negative photosensitive resin composition. The negative photosensitive resin composition contains a resin of a specific structure (A), a photopolymerization initiator (C), and a compound of a specific structure (D), the cured product of the negative photosensitive resin composition, and the method for producing the patterned cured film using the negative photosensitive resin composition.
[과제] 높은 굴절률을 갖고, 또한 볼록 렌즈 형상을 가지는 패턴화된 경화막을 형성할 수 있는 네거티브형 감광성 수지 조성물, 당해 네거티브형 감광성 수지 조성물의 경화물, 및, 전술의 네거티브형 감광성 수지 조성물을 이용하는 경화물의 제조 방법을 제공하는 것. [해결 수단] 특정 구조의 수지(A)와, 광 중합 개시제(C)와, 특정 구조의 화합물(D)을 포함하는 네거티브형 감광성 수지 조성물, 당해 네거티브형 감광성 수지 조성물의 경화물, 및, 전술의 네거티브형 감광성 수지 조성물을 이용하는 패턴화된 경화막의 제조 방법.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION CURED PRODUCT AND METHOD OF MANUFACTURING PATTERNED CURED PRODUCT |
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