NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION CURED PRODUCT AND METHOD OF MANUFACTURING PATTERNED CURED PRODUCT

The present invention is to provide a negative photosensitive resin composition that has a high refractive index and can form a patterned cured film having a convex lens shape, a cured product of the negative photosensitive resin composition, and a method for producing a cured product using the nega...

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Bibliographische Detailangaben
Hauptverfasser:	HIKIDA JIRO, FURUYA KAZUYUKI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention is to provide a negative photosensitive resin composition that has a high refractive index and can form a patterned cured film having a convex lens shape, a cured product of the negative photosensitive resin composition, and a method for producing a cured product using the negative photosensitive resin composition. The negative photosensitive resin composition contains a resin of a specific structure (A), a photopolymerization initiator (C), and a compound of a specific structure (D), the cured product of the negative photosensitive resin composition, and the method for producing the patterned cured film using the negative photosensitive resin composition. [과제] 높은 굴절률을 갖고, 또한 볼록 렌즈 형상을 가지는 패턴화된 경화막을 형성할 수 있는 네거티브형 감광성 수지 조성물, 당해 네거티브형 감광성 수지 조성물의 경화물, 및, 전술의 네거티브형 감광성 수지 조성물을 이용하는 경화물의 제조 방법을 제공하는 것. [해결 수단] 특정 구조의 수지(A)와, 광 중합 개시제(C)와, 특정 구조의 화합물(D)을 포함하는 네거티브형 감광성 수지 조성물, 당해 네거티브형 감광성 수지 조성물의 경화물, 및, 전술의 네거티브형 감광성 수지 조성물을 이용하는 패턴화된 경화막의 제조 방법.