CHEMICAL MECHANICAL POLISHING METHOD AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

Provided are a chemical mechanical polishing method, which is able to improve quality and productivity of a chemical mechanical polishing process, and a method for manufacturing a semiconductor device using the same. The chemical mechanical polishing method is for a target to be polished including a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BYUN YEA RIN, KIM IN KWON, KIM SANG KYUN, LEE HYO SAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES
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