Lamp unit and hybrid chamber

The present invention relates to a lamp unit and a hybrid chamber and, more specifically, to a lamp unit and a hybrid chamber which can perform both a gas phase etching (GPE) process using a gas and a radical dry cleaning (RDC) process using plasma in one chamber in a substrate processing process. 본...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	AN MYEONG HEON, KIM JIN YOUNG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	The present invention relates to a lamp unit and a hybrid chamber and, more specifically, to a lamp unit and a hybrid chamber which can perform both a gas phase etching (GPE) process using a gas and a radical dry cleaning (RDC) process using plasma in one chamber in a substrate processing process. 본 발명은 램프유닛 및 하이브리드 챔버에 대한 것으로서, 보다 상세하게는 보다 상세하게는 기판에 대한 처리공정에서 가스를 이용하는 GPE(Gas Phase Etching) 공정과 플라즈마를 이용하는 RDC(Radical Dry Cleaning) 공정을 하나의 챔버에서 모두 수행할 수 있는 램프유닛 및 하이브리드 챔버에 대한 것이다.