Method for manufacturing semiconductor device

The technical idea of the present invention is to provide a method of manufacturing a semiconductor device capable of preventing failure of a source/drain contact. The method of manufacturing a semiconductor device comprises the steps of: forming, on a substrate, dummy gates extending in a first dir...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PARK CHAN KYO, HUR SUNG GI, JEON JAE HO, OH SEUNG CHUL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!