Apparatus For Cleaning Nozzle For Dispenser And Method For Cleaning The Inside Of Nozzle using thereof

The present invention relates to a nozzle cleaning device for dispensers used in display/semiconductor processes and a method for cleaning the inside of a nozzle using the same, and more specifically, to a nozzle cleaning device for dispensers used in display/semiconductor processes, in which a clea...

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Bibliographische Detailangaben
Hauptverfasser:	CHOI NAM KYU, SHIM HYUN WOK, JUNG SUNG JIN, KIM MOO SONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS CLEANING CLEANING IN GENERAL NOZZLES PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention relates to a nozzle cleaning device for dispensers used in display/semiconductor processes and a method for cleaning the inside of a nozzle using the same, and more specifically, to a nozzle cleaning device for dispensers used in display/semiconductor processes, in which a cleaning liquid is repeatedly injectied and sucked into a nozzle from an internal space of an ultrasonic cleaner and the inside of the nozzle is cleaned using a microneedle with a smaller diameter than the inner diameter of the nozzle, and thus, the breakage and damage to the nozzle are minimized during cleaning, allowing repeated use of the nozzle, and a method for cleaning the inside of a nozzle using the same. 본 발명은 디스플레이/반도체 공정에서 사용되는 디스펜서용 노즐세정장치 및 이를 이용하여 노즐의 내부를 세정하는 방법으로서, 더욱 상세하게는 초음파세척기의 내부공간에서 노즐 내부로 세정액을 반복적으로 주입 및 흡입하고 노즐 내경보다 작은 직경을 갖는 미세바늘을 이용하여 노즐의 내부를 세정함으로써 세정 시 노즐의 파손 및 손상을 최소화하여 노즐의 반복사용이 가능한, 디스플레이/반도체 공정에서 사용되는 디스펜서용 노즐세정장치 및 이를 이용하여 노즐의 내부를 세정하는 방법에 관한 것이다.