SUBSTRATE HOLDING DEVICE AND APPARATUS FOR PROCESSING SUBSTRATE INCLUDING THE SAME

According to the present invention, a technical concept is a substrate holding device that protects a substrate from plasma until a certain period of time has elapsed after start of an etch rate measurement experiment. According to the present invention, the substrate holding device comprises: a sub...

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Bibliographische Detailangaben
Hauptverfasser:	KANG JEONG SEOK, YANG YOUNG HWAN, RO SOO RYUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	According to the present invention, a technical concept is a substrate holding device that protects a substrate from plasma until a certain period of time has elapsed after start of an etch rate measurement experiment. According to the present invention, the substrate holding device comprises: a substrate protection member that protects a film on an upper end of the substrate from plasma; and a substrate mounting member on which the substrate is mounted. 본 발명의 기술적 가상은 식각률 측정 실험 시작 후 일정 시간 경과할 때까지 기판을 플라즈마로부터 보호하는 기판 홀딩 장치로서, 본 발명의 기판 홀딩 장치는 기판 상단의 막질을 플라즈마로부터 보호하는 기판 보호 부재 및 기판이 거치되는 기판 거치 부재를 포함한다.