PUMP APPARATUS FOR TREATING CHEMICAL AND APPARATUS FOR TREATING SUBSTRATE

Provided are a pump, a chemical supply apparatus, and a substrate treatment apparatus. The pump according to one embodiment of the present invention comprises: a tube which has elasticity and is formed with a flow path for allowing chemicals to flow therein; and a case which is divided into at least...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JUNG SUNG CHUL, CHOI BYOUNG DOO, SON YOUNG JUN, LEE WOO RAM, JUNG WOO SIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS SEMICONDUCTOR DEVICES WEAPONS
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