Method for forming amorphous TiO2 thin film using low temperature atomic layer deposition and method for fabricating optical structure

Disclosed are a forming method of an amorphous titanium dioxide thin film using a low-temperature atomic layer deposition method and a manufacturing method of an optical structure, which can simplify manufacturing processes. The forming method of a titanium dioxide (TiO_2) thin film comprises: a ste...

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Hauptverfasser:	PARK, HONGK KYU, SHIN HYUN JUNG, YUN, SEOK HO, PARK HYOUNG MIN, LIM, MIN WOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CALCULATING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPUTING COUNTING DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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