Method for forming amorphous TiO2 thin film using low temperature atomic layer deposition and method for fabricating optical structure

Disclosed are a forming method of an amorphous titanium dioxide thin film using a low-temperature atomic layer deposition method and a manufacturing method of an optical structure, which can simplify manufacturing processes. The forming method of a titanium dioxide (TiO_2) thin film comprises: a ste...

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Bibliographische Detailangaben
Hauptverfasser:	PARK, HONGK KYU, SHIN HYUN JUNG, YUN, SEOK HO, PARK HYOUNG MIN, LIM, MIN WOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CALCULATING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPUTING COUNTING DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Disclosed are a forming method of an amorphous titanium dioxide thin film using a low-temperature atomic layer deposition method and a manufacturing method of an optical structure, which can simplify manufacturing processes. The forming method of a titanium dioxide (TiO_2) thin film comprises: a step of supplying a Ti precursor to a substrate provided in a process chamber to adsorb the Ti precursor; a step of exposing the Ti precursor to the substrate without the Ti precursor adsorbed thereonto to form a Ti precursor film on the substrate; a step of supplying an O_2 precursor to the Ti precursor film to cause a reaction; and a step of exposing the O_2 precursor to the Ti precursor film without a reaction with the O_2 precursor to cause a reaction to form the TiO_2 thin film on the substrate. 저온 원자층 증착법을 이용한 비정질 이산화티타늄 박막의 형성방법 및 광학 구조물의 제조방법이 개시된다. 개시된 이산화티타늄 박막의 형성방법은, 공정 챔버 내에 마련된 기판에 Ti 전구체를 공급하여 흡착시키는 단계; 상기 Ti 전구체가 흡착되지 않은 상기 기판에 상기 Ti 전구체를 노출시켜 상기 기판에 Ti 전구체막을 형성하는 단계; 상기 Ti 전구체막에 O2 전구체를 공급하여 반응시키는 단계; 및 상기 O2 전구체와 반응하지 않은 상기 Ti 전구체막에 상기 O2 전구체를 노출시켜 반응시킴으로써 상기 기판에 상기 TiO2 박막을 형성하는 단계;를 포함한다.