SUPPORT UNIT SUBSTRATE PROCESSING APPARATUS INCLUDING SAME

The present invention provides a support unit. The support unit supporting a substrate includes a heating member and a reflecting plate. The reflecting plate may include a curved surface which reflects heat energy generated by the heating member to an edge area of the substrate. According to an embo...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	YUN KANG SEOP, LEE YOUNG IL, CHOI JUNG BONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	The present invention provides a support unit. The support unit supporting a substrate includes a heating member and a reflecting plate. The reflecting plate may include a curved surface which reflects heat energy generated by the heating member to an edge area of the substrate. According to an embodiment of the present invention, processing uniformity for a substrate can be improved. 본 발명은 지지 유닛을 제공한다. 기판을 지지하는 지지 유닛은, 가열 부재 및 반사 판을 포함하고, 상기 반사 판은, 상기 가열 부재가 발생시키는 열 에너지를 상기 기판의 가장자리 영역으로 반사시키는 곡면을 포함할 수 있다.