SUBSTRATE PROCESSING APPARATUS AND METHOD FOR CORRECTING POSITIONAL DISPLACEMENT
The present invention is to provide technology for suppressing positional displacement. A mounting plate is positioned by a first positioning instrument in a direction in which a processing container expands and contracts due to expansion and contraction according to temperature changes and is mount...
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| creator | KOBAYASHI TAMIHIRO |
| description | The present invention is to provide technology for suppressing positional displacement. A mounting plate is positioned by a first positioning instrument in a direction in which a processing container expands and contracts due to expansion and contraction according to temperature changes and is mounted on the processing container with respect to a predetermined reference position that serves as a standard for measuring positional displacement within the processing container. A mounting table is positioned in a position opposite to the position of the first positioning instrument with respect to the reference position by a second positioning instrument and is placed in the processing container via a support instrument mounted on the mounting plate. The substrate is mounted thereon.
[과제] 위치 어긋남을 억제하는 기술을 제공하는 것. [해결 수단] 장착 플레이트는, 처리 용기 내의 위치 어긋남을 계측하는 기준이 되는 소정의 기준 위치에 대해서, 온도 변화에 의한 팽창, 수축에 의해 처리 용기가 신축하는 신축 방향으로 제 1 위치결정 기구에 의해 위치결정하여 처리 용기에 장착되어 있다. 탑재대는, 기준 위치에 대해서, 제 1 위치결정 기구의 위치의 반대측이 되는 위치에 제 2 위치결정 기구에 의해 위치결정하여 장착 플레이트에 장착된 지지 기구를 거쳐서 처리 용기 내에 배치되고, 기판이 탑재된다. |
| format | Patent |
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[과제] 위치 어긋남을 억제하는 기술을 제공하는 것. [해결 수단] 장착 플레이트는, 처리 용기 내의 위치 어긋남을 계측하는 기준이 되는 소정의 기준 위치에 대해서, 온도 변화에 의한 팽창, 수축에 의해 처리 용기가 신축하는 신축 방향으로 제 1 위치결정 기구에 의해 위치결정하여 처리 용기에 장착되어 있다. 탑재대는, 기준 위치에 대해서, 제 1 위치결정 기구의 위치의 반대측이 되는 위치에 제 2 위치결정 기구에 의해 위치결정하여 장착 플레이트에 장착된 지지 기구를 거쳐서 처리 용기 내에 배치되고, 기판이 탑재된다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230816&DB=EPODOC&CC=KR&NR=20230119598A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230816&DB=EPODOC&CC=KR&NR=20230119598A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KOBAYASHI TAMIHIRO</creatorcontrib><title>SUBSTRATE PROCESSING APPARATUS AND METHOD FOR CORRECTING POSITIONAL DISPLACEMENT</title><description>The present invention is to provide technology for suppressing positional displacement. A mounting plate is positioned by a first positioning instrument in a direction in which a processing container expands and contracts due to expansion and contraction according to temperature changes and is mounted on the processing container with respect to a predetermined reference position that serves as a standard for measuring positional displacement within the processing container. A mounting table is positioned in a position opposite to the position of the first positioning instrument with respect to the reference position by a second positioning instrument and is placed in the processing container via a support instrument mounted on the mounting plate. The substrate is mounted thereon.
[과제] 위치 어긋남을 억제하는 기술을 제공하는 것. [해결 수단] 장착 플레이트는, 처리 용기 내의 위치 어긋남을 계측하는 기준이 되는 소정의 기준 위치에 대해서, 온도 변화에 의한 팽창, 수축에 의해 처리 용기가 신축하는 신축 방향으로 제 1 위치결정 기구에 의해 위치결정하여 처리 용기에 장착되어 있다. 탑재대는, 기준 위치에 대해서, 제 1 위치결정 기구의 위치의 반대측이 되는 위치에 제 2 위치결정 기구에 의해 위치결정하여 장착 플레이트에 장착된 지지 기구를 거쳐서 처리 용기 내에 배치되고, 기판이 탑재된다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyk0KwjAQQOFsXIh6h4Guhf4g2OWYTG2wTUJmui5F4kq0UO-PCh7A1YPHt1aBhxNLRCEI0Wtitu4MGAJ-3sCAzkBP0noDjY-gfYyk5WuCZyvWO-zAWA4daurJyVatbtN9SbtfNyprSHS7T_NzTMs8XdMjvcZLLPOyyouiPtRHrP5Tb3MxMHQ</recordid><startdate>20230816</startdate><enddate>20230816</enddate><creator>KOBAYASHI TAMIHIRO</creator><scope>EVB</scope></search><sort><creationdate>20230816</creationdate><title>SUBSTRATE PROCESSING APPARATUS AND METHOD FOR CORRECTING POSITIONAL DISPLACEMENT</title><author>KOBAYASHI TAMIHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230119598A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KOBAYASHI TAMIHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KOBAYASHI TAMIHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE PROCESSING APPARATUS AND METHOD FOR CORRECTING POSITIONAL DISPLACEMENT</title><date>2023-08-16</date><risdate>2023</risdate><abstract>The present invention is to provide technology for suppressing positional displacement. A mounting plate is positioned by a first positioning instrument in a direction in which a processing container expands and contracts due to expansion and contraction according to temperature changes and is mounted on the processing container with respect to a predetermined reference position that serves as a standard for measuring positional displacement within the processing container. A mounting table is positioned in a position opposite to the position of the first positioning instrument with respect to the reference position by a second positioning instrument and is placed in the processing container via a support instrument mounted on the mounting plate. The substrate is mounted thereon.
[과제] 위치 어긋남을 억제하는 기술을 제공하는 것. [해결 수단] 장착 플레이트는, 처리 용기 내의 위치 어긋남을 계측하는 기준이 되는 소정의 기준 위치에 대해서, 온도 변화에 의한 팽창, 수축에 의해 처리 용기가 신축하는 신축 방향으로 제 1 위치결정 기구에 의해 위치결정하여 처리 용기에 장착되어 있다. 탑재대는, 기준 위치에 대해서, 제 1 위치결정 기구의 위치의 반대측이 되는 위치에 제 2 위치결정 기구에 의해 위치결정하여 장착 플레이트에 장착된 지지 기구를 거쳐서 처리 용기 내에 배치되고, 기판이 탑재된다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | SUBSTRATE PROCESSING APPARATUS AND METHOD FOR CORRECTING POSITIONAL DISPLACEMENT |
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