ARTIFICIAL MARBLE AND METHOD FOR MANUFACTURING THE SAME

Artificial marble according to an embodiment of the present invention comprises a base area and a pattern area, wherein the pattern has a width of less than 2 cm and a length of 5 cm or more. A base resin composition and a pattern resin composition that form the base area and the pattern area, respe...

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Bibliographische Detailangaben
Hauptverfasser: LEE SANGNAM, CHO HONGKWAN, LEE JOONGHEON, KIM DONGHEE, CHOI YOUNGWOO, YUE SEONG HOON
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:Artificial marble according to an embodiment of the present invention comprises a base area and a pattern area, wherein the pattern has a width of less than 2 cm and a length of 5 cm or more. A base resin composition and a pattern resin composition that form the base area and the pattern area, respectively, have different components. 본 발명의 일 실시상태에 따른 인조대리석은, 베이스 영역 및 패턴 영역을 포함하고, 상기 패턴의 폭은 2cm 미만이고, 길이는 5cm 이상이며, 상기 베이스 영역 및 패턴 영역을 각각 형성하는 베이스용 수지 조성물 및 패턴용 수지 조성물은 구성성분이 서로 상이하다.