standby port and substrate processing apparatus having the same

The present invention relates to an atmospheric port and a substrate processing device having the same. By inhaling and removing the fume generated, when the processing liquid is discharged to the atmospheric port before supplying the processing liquid to the substrate, the atmospheric port prevents...

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Bibliographische Detailangaben
Hauptverfasser:	JANG YOUNG JIN, KIM JONG HAN, CHOI YOUNG JUN, WOO JONG HYEON, KIM DAE HUN, JUNG BU YOUNG, YU JIN TACK, PARK GUI SU, SHIN CHEOL YONG, BANG BYUNG SUN, KIM HEE HWAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY NOZZLES PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention relates to an atmospheric port and a substrate processing device having the same. By inhaling and removing the fume generated, when the processing liquid is discharged to the atmospheric port before supplying the processing liquid to the substrate, the atmospheric port prevents contamination of the chamber atmosphere. 본 발명은 대기 포트 및 이를 가지는 기판 처리 장치에 관한 것으로, 기판으로의 처리액 공급 전 처리액이 대기 포트에 토출될 때, 발생되는 흄을 흡입해 제거함으로써, 챔버 분위기의 오염을 방지하는 대기 포트 및 이를 가지는 기판 처리 장치를 제공한다.