2 Photosensitive resin composition comprising two or more oxime ester fluorene derivative compounds as photoinitiator component
The present invention relates to a photosensitive resin composition containing two or more oxime ester fluorene derivative compounds as a photoinitiator component, and more specifically, to a photosensitive resin composition, by including a combination of two or more structurally different oxime est...
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | The present invention relates to a photosensitive resin composition containing two or more oxime ester fluorene derivative compounds as a photoinitiator component, and more specifically, to a photosensitive resin composition, by including a combination of two or more structurally different oxime ester fluorene derivative compounds as a photoinitiator component, which exhibits excellent deep curing properties in thick thin films, increasing the degree of curing of a thin film and improving the adhesion and straightness of a pattern, which is an advantageous characteristic for a photolithography method, and can be removed with a water-soluble base solution to be used in LED, TFT-LCD, MEMS, and semiconductor fields.
본 발명은 광개시제 성분으로서 2종 이상의 옥심에스테르 플루오렌 유도체 화합물을 포함하는 감광성 수지 조성물에 관한 것으로, 보다 상세하게는, 광개시제 성분으로서 구조적으로 상이한 옥심에스테르 플루오렌 유도체 화합물 2종 이상의 조합을 포함함으로써, 두께가 높은 박막에서 우수한 심부 경화성을 나타내어 박막의 경화도 증가 및 패턴의 접착성과 직진성을 향상시켜 포토리소그래피법에 유리한 특성을 가지고, 수용성 기반 용액으로 제거 가능하여 LED, TFT-LCD, MEMS, 반도체 분야에서 적합하게 사용될 수 있는 감광성 수지 조성물에 관한 것이다. |
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