PHOTOSENSITIVE RESIN COMPOSITION DISPLAY DEVICE AND FORMING METHOD OF PATTERN

Provided is a photosensitive resin composition that can form a forward taper when forming a pattern in a low-temperature curing process and implement a cured film with high hardness. The photosensitive resin composition according to one embodiment of the present invention comprises: 100 parts by wei...

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Bibliographische Detailangaben
Hauptverfasser:	RYU YOUNG JUN, YOUN HYOC MIN, JEONG JONG HO, AHN CHANG HWAN, KIM JIN SUN, JEON SEUNG HAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Provided is a photosensitive resin composition that can form a forward taper when forming a pattern in a low-temperature curing process and implement a cured film with high hardness. The photosensitive resin composition according to one embodiment of the present invention comprises: 100 parts by weight of an alkali-soluble resin, 2 to 40 parts by weight of an initiator, 2 to 100 parts by weight of a multifunctional compound, more than 1 to 30 or less parts by weight of a plasticizer, and more than 0 to 15 or less parts by weight of an epoxy-based additive. 저온 경화 공정에서 패턴 형성 시 순테이퍼를 형성하고 높은 경도를 갖는 경화막을 구현할 수 있는 감광성 수지 조성물이 제공된다. 본 발명의 일 실시예는 알칼리 가용성 수지 100 중량부, 개시제 2 내지 40 중량부, 다관능성 화합물 2 내지 100 중량부, 가소제 1 초과 30 이하 중량부 및 에폭시계 첨가제 0 초과 15 이하 중량부를 포함하는 감광성 수지 조성물을 제공한다.