MANUFACTURING METHOD OF DEFECT-FREE FERROELECTRIC THIN FILM USING LATTICE STRAIN CONTROL

A method for manufacturing a zero-defect ferroelectric thin film using lattice strain control, includes the following steps of: locating a barium titanate (BTO) target in a vacuum chamber; depositing a barium titanate thin film on a magnesium oxide substrate via a vacuum evaporation method, in an ox...

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Bibliographische Detailangaben
Hauptverfasser:	KIM JONGBUM, JEON YOUNG UK, KIM BOGYU, KANG JOONHYUN, KIM GEUNPIL, LEE KWAN IL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A method for manufacturing a zero-defect ferroelectric thin film using lattice strain control, includes the following steps of: locating a barium titanate (BTO) target in a vacuum chamber; depositing a barium titanate thin film on a magnesium oxide substrate via a vacuum evaporation method, in an oxygen partial pressure environment of 30 mTorr or less for lattice strain control; and thermally post-treating the deposited thin film and forming a ferroelectric barium titanate thin film in order to restore lattice strain in a sintering furnace of a barium titanate air atmosphere. Accordingly, the method is capable of maintaining the crystallinity of the thin film while reducing defects on the surface thereof by controlling lattice strain during the thin film growth procedure, and capable of maximizing ferroelectric properties of the thin film by restoring lattice strain through thermal posttreatment. 격자변형 제어를 이용한 무결점 강유전체 박막 제조 방법은, 진공 챔버 내에 티탄산 바륨(BTO) 타겟을 위치시키는 단계; 격자변형 제어를 위해 30 mTorr 이하의 산소 분압 환경에서, 진공증착법을 통해 산화 마그네슘 기판 상에 티탄산 바륨 박막을 증착시키는 단계; 및 증착된 박막을 티탄산 바륨 공기 분위기의 소결로 속에서 격자변형을 복원하기 위해 후 열처리하여 강유전체 티탄산 바륨 박막을 형성하는 단계;를 포함한다. 이에 따라, 박막 성장 과정에서 격자변형을 제어하여 박막의 결정성은 유지시키면서 표면의 결함을 줄이고, 후공정 열처리를 통하여 격자변형을 복원하여 박막의 강유전체 특성을 최대화시킬 수 있다.