SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

A substrate processing device is equipped with: a chamber; a decompression equipment that decompresses an internal space of the chamber; a substrate holding support part that hold-supports a substrate having a film in the internal space; a cover installed with a plurality of openings and covering th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KISHIMOTO KATSUSHI, NISHIKAWARA TOMOFUMI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CONVEYING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HANDLING THIN OR FILAMENTARY MATERIAL PACKING PERFORMING OPERATIONS PNEUMATIC TUBE CONVEYORS SEMICONDUCTOR DEVICES SHOP CONVEYOR SYSTEMS STORING TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING
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Beschreibung
Zusammenfassung:	A substrate processing device is equipped with: a chamber; a decompression equipment that decompresses an internal space of the chamber; a substrate holding support part that hold-supports a substrate having a film in the internal space; a cover installed with a plurality of openings and covering the substrate hold-supported by the substrate holding support in the internal space; a gas analyzer that detects a specific gas of a substrate accommodating space surrounded by the substrate holding support part and the cover; and a controller that determines a drying end of the film based on an output of the gas analyzer. Therefore, the present invention is capable of improving a throughput of the process of drying the film of the substrate. 기판　처리 장치는, 챔버와, 상기 챔버의 내부공간을 감압하는 감압 기구와, 막을 가지는 기판을 상기 내부공간에서 보유지지하는 기판보유지지부와, 복수의 개구가 설치되며 상기 내부공간에서 상기 기판보유지지부에 의해 보유지지된 상기 기판을 덮는 커버와, 상기 기판보유지지부 및 상기 커버에 의해 둘러싸여진 기판 수용 공간의 특정 가스를 검출하는 가스 분석계와, 상기 가스 분석계의 출력에 기초하여 상기 막의 건조 종료를 판정하는 컨트롤러를 구비한다.