SUBSTRATE PROCESSING APPARATUS SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM

The present invention relates to a device, which performs light irradiation to remove organic substances from the entire rear surface of a corresponding substrate without unnecessary treatment on a surface of a substrate. The device comprises: a substrate holding support unit for locally overlapping...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MATSUDA YOSHITAKA, OHISHI YUZO, KODAMA TERUHIKO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!