JIG AND POLISHING APPARATUS INCLUDING THE SAME

The present invention relates to a jig and a polishing apparatus including the same. The jig comprises: a seating unit having an accommodation space in which a target object to be polished is seated; a first guide unit formed to surround the outer surface of the seating unit; and a second guide unit...

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Bibliographische Detailangaben
Hauptverfasser:	JEON JAE SEUNG, NOH JIN HYEONG, SHIM BYOUNG YUL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS FREQUENCY-CHANGING GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PERFORMING OPERATIONS PHYSICS POLISHING TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention relates to a jig and a polishing apparatus including the same. The jig comprises: a seating unit having an accommodation space in which a target object to be polished is seated; a first guide unit formed to surround the outer surface of the seating unit; and a second guide unit surrounding the outside surface of the first guide unit and having the inclined outside surface. Accordingly, in a process of polishing the bottom of the target object using the jig, polishing amount reduction of the target object is minimized. 지그는 연마의 대상이 되는 대상물이 안착되는 수용 공간을 갖는 안착부, 안착부의 외면을 둘러싸도록 형성되는 제1 가이드부 및 제1 가이드부의 외측면을 둘러싸고, 경사진 외측면을 갖는 제2 가이드부를 포함한다. 이에 따라, 지그를 사용하여 대상물의 저면을 연마하는 공정에 있어서, 대상물의 연마량 감소가 최소화된다.