SUBSTRATE PROCESSING APPARATUS INCLUDING PROCESSING LIQUID SUPPLY UNIT AND PROCESSING LIQUID SUPPLY METHOD

According to the present invention, a processing liquid supply unit, a substrate processing apparatus including the same, and a processing liquid supply method may be provided. The processing liquid supply unit includes: a storage part for storing a processing liquid for a substrate processing proce...

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Bibliographische Detailangaben
Hauptverfasser: YOUN JUN HEE, CHOI YOUNG SEOP
Format: Patent
Sprache:eng ; kor
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