SUBSTRATE PROCESSING APPARATUS INCLUDING PROCESSING LIQUID SUPPLY UNIT AND PROCESSING LIQUID SUPPLY METHOD

According to the present invention, a processing liquid supply unit, a substrate processing apparatus including the same, and a processing liquid supply method may be provided. The processing liquid supply unit includes: a storage part for storing a processing liquid for a substrate processing proce...

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Bibliographische Detailangaben
Hauptverfasser:	YOUN JUN HEE, CHOI YOUNG SEOP
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS SEMICONDUCTOR DEVICES SEPARATION TESTING TRANSPORTING
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Beschreibung
Zusammenfassung:	According to the present invention, a processing liquid supply unit, a substrate processing apparatus including the same, and a processing liquid supply method may be provided. The processing liquid supply unit includes: a storage part for storing a processing liquid for a substrate processing process; a supply part that supplies a raw material to the storage part through a connection pipe; and a foreign matter blocking part that is installed on the connection pipe and prevents foreign matter from entering the storage part. 본 발명에 의하면 기판의 처리 공정을 위한 처리액을 저장하는 저장부; 연결 배관을 통해 상기 저장부로 원료를 공급하는 공급부; 및 상기 연결 배관 상에 설치되고 상기 저장부로의 이물질 유입을 방지하기 위한 이물질 차단부를 포함하는 처리액 공급 유닛과 이를 포함하는 기판 처리 장치 및 처리액 공급 방법이 제공될 수 있다.