ETCHANT COMPOSITION FOR METAL LAYER CONTAINING SILVER OR INDIUM AND METHOD FOR MANUFACTURING THE SAME

The present invention relates to a composition for selectively etching an indium or silver-containing metal film. According to the present invention, provided is an etchant composition indicating excellent etching characteristics in terms of etching speed, bias, residue, precipitate, and etching uni...

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Bibliographische Detailangaben
Hauptverfasser:	JUNG SEOK IL, PARK JONG HEE, KIM IK JOON, KIM YANG RYEONG, JEONG MIN GYEONG, KIM SE HOON, LEE BO YEON, NOH WON HO, KIM HYOUNG SIK, PARK SANG SEUNG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NATURAL RESINS NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PAINTS POLISHES SEMICONDUCTOR DEVICES
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