ETCHANT COMPOSITION FOR METAL LAYER CONTAINING SILVER OR INDIUM AND METHOD FOR MANUFACTURING THE SAME

The present invention relates to a composition for selectively etching an indium or silver-containing metal film. According to the present invention, provided is an etchant composition indicating excellent etching characteristics in terms of etching speed, bias, residue, precipitate, and etching uni...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JUNG SEOK IL, PARK JONG HEE, KIM IK JOON, KIM YANG RYEONG, JEONG MIN GYEONG, KIM SE HOON, LEE BO YEON, NOH WON HO, KIM HYOUNG SIK, PARK SANG SEUNG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NATURAL RESINS NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PAINTS POLISHES SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The present invention relates to a composition for selectively etching an indium or silver-containing metal film. According to the present invention, provided is an etchant composition indicating excellent etching characteristics in terms of etching speed, bias, residue, precipitate, and etching uniformity while minimizing damage to an underlying metal film. 본 발명은 인듐 또는 은 함유 금속막을 선택적으로 식각하기 위한 조성물에 관한 것이다. 본 발명에 따르면, 하부 금속막의 손상을 최소화하면서도, 식각 속도, 바이어스, 잔사, 석출물, 식각 균일도 면에서 모두 우수한 식각 특성을 나타내는 식각액 조성물을 제공할 수 있다.