Substrate treating apparatus and process control method thereof

The present invention relates to a substrate processing device and a process management method of the substrate processing device. According to the disclosed process management technology of the substrate processing facility, by identifying the process status of each of multiple process chambers pro...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	YANG YOUNG HWAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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