Eco-friendly photoresist stripper composition

The present invention relates to an eco-friendly photoresist stripper composition, and more specifically, to an eco-friendly photoresist stripper composition which comprises 20 to 50 wt% of glycol ether, 1 to 10 wt% of cyclic alcohol, 1 to 10 wt% of an inhibitor that prevents corrosion of aluminum a...

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Bibliographische Detailangaben
Hauptverfasser:	LEE HYUCK JAE, YUN SANG MOON, JEON JUNG IG, IHN CHI SUNG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to an eco-friendly photoresist stripper composition, and more specifically, to an eco-friendly photoresist stripper composition which comprises 20 to 50 wt% of glycol ether, 1 to 10 wt% of cyclic alcohol, 1 to 10 wt% of an inhibitor that prevents corrosion of aluminum and copper, 0.5 to 10 wt% of alkanol amine, 0.01 to 10 wt% of a reducing sulfur compound, and the remainder consisting of water. Therefore, the eco-friendly photoresist stripper composition does not generate toxic formaldehyde. 본 발명은 친환경 포토레지스트 박리액 조성물에 관한 것으로, 좀더 상세하게 설명하자면, 글리콜 에테르 20~50 중량%, 환형 알코올 1~10 중량%, 알루미늄 및 구리의 부식을 방지하는 인히비터(inhibitor) 1~10 중량%, 알칸올 아민 0.5~10 중량%, 환원성 황화합물 0.01~10 중량%, 그리고 잔량의 물을 포함하여 구성됨으로써, 유독성 포름알데히드를 발생시키지 않는 친환경 포토레지스트 박리액 조성물에 관한 것이다.