Composite polishing pad comprising a thin film with high wear resistance stitched with carbon nanotubes and method for manufacturing the same

Provided are a composite polishing pad for a CMP and a manufacturing method thereof. The composite polishing pad for the CMP of the present invention comprises: a soft polymer base layer including a plurality of protrusions formed on the upper part surface; a carbon nanotube layer including a carbon...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: JEONG JI HUN, RYU HYUN JUN, MIN BYUNG JU, KANG SUK KYUNG, KANG MIN WOO, HONG SEOK JI, KIM SEUNG GEUN, CHOI JUNG HEE, KIM SAN HA, OH NAM GUE, KIM SEONG JAE
Format: Patent
Sprache:eng ; kor
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Provided are a composite polishing pad for a CMP and a manufacturing method thereof. The composite polishing pad for the CMP of the present invention comprises: a soft polymer base layer including a plurality of protrusions formed on the upper part surface; a carbon nanotube layer including a carbon nanotube embedded and bonded to a base layer upper part; and a hard polymer coating layer in which the externally protruding carbon nanotube is embedded and bonded to a carbon nanotube layer upper part. An objective of the present invention is to provide the composite polishing pad for the CMP, with greatly improved polishing performance and lifespan, and the efficient manufacturing method thereof. 본 발명은 상부면에 성형된 다수개의 돌기를 포함하는 연질 폴리머 기재층; 상기 기재층 상부에 함입되어 결착된 탄소나노튜브들을 포함하는 탄소나노튜브층; 및 상기 탄소나노튜브층 상부에 외부로 돌출된 탄소나노튜브들을 함입하여 결착시킨 경질 폴리머 코팅층;을 포함하는 CMP용 복합 연마패드 및 이의 제조방법을 제공한다.