APPARATUS FOR TREATING SUBSTRATE

The present invention provides an apparatus for processing a substrate. A substrate processing apparatus includes: a plurality of processing units having an internal space therein; individual exhaust ducts coupled to each processing unit and exhausting the atmosphere within the internal space; and a...

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Bibliographische Detailangaben
Hauptverfasser:	PARK CHUN WOO, SONG GYEONG WON, LEE JAE SEONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS USING FREE VORTEX FLOW, e.g. CYCLONES BASIC ELECTRIC ELEMENTS BLASTING CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL ORCHEMICAL PROCESSES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING JOINTS OR FITTINGS FOR PIPES LIGHTING MEANS FOR THERMAL INSULATION IN GENERAL MECHANICAL ENGINEERING PERFORMING OPERATIONS PIPES SEMICONDUCTOR DEVICES SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING THERMAL INSULATION IN GENERAL TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	The present invention provides an apparatus for processing a substrate. A substrate processing apparatus includes: a plurality of processing units having an internal space therein; individual exhaust ducts coupled to each processing unit and exhausting the atmosphere within the internal space; and an integrated exhaust duct connected to the individual exhaust ducts. A filtration unit is installed in the individual exhaust ducts to remove fume exhausted through the individual exhaust ducts. Therefore, it is possible to prevent large amounts of fume from attaching to the front of an exhaust pressure control device. 본 발명은 기판을 처리하는 장치를 제공한다. 기판 처리 장치는 내부에 내부 공간을 가지는 복수의 처리 유닛과, 각각의 처리 유닛에 결합되며 내부 공간 내의 분위기를 배기하는 개별 배기 덕트, 그리고 개별 배기 덕트들에 연결되는 통합 배기 덕트를 포함한다. 개별 배기 덕트들에는 상기 개별 배기 덕트를 통해 배기 되는 흄을 제거하는 여과 유닛이 설치된다.