Composition for light-shielding film and light-shielding film using the same

The purpose of the present invention is to provide a composition for a light-shielding film having low blackness and reflectance and a light-shielding film made therefrom. According to the present invention, the composition for a light-shielding film comprises carbon-based particles, a thermosetting...

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Bibliographische Detailangaben
Hauptverfasser:	KIM YOUN SEOK, YOON JUNG HYUN, PARK SUN CHAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ADHESIVES AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES FILLING PASTES GENERAL PROCESSES OF COMPOUNDING INKS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS USE OF MATERIALS THEREFOR WOODSTAINS WORKING-UP
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Beschreibung
Zusammenfassung:	The purpose of the present invention is to provide a composition for a light-shielding film having low blackness and reflectance and a light-shielding film made therefrom. According to the present invention, the composition for a light-shielding film comprises carbon-based particles, a thermosetting binder resin, a dispersant, polymer beads, and a solvent, wherein the carbon-based particle is a reduced graphene oxide (rGO) particle, a graphene nano platelet (GNP) particle, or a mixture thereof and the polymer bead is at least one selected from a group of consisting of poly(butyl methylacrylate) (PBMA), polymethyl methacrylate (PMMA), and polymethyl silsesquioxane (PMSQ). 본 발명의 목적은 블랙도와 반사율이 낮은 차광필름용 조성물 및 그로부터 만들어지는 차광필름을 제공함에 있다. 상기와 같은 목적을 달성하기 위해 본 발명에서는 탄소계 입자, 열경화성 바인더 수지, 분산제, 폴리머 비드 및 용제를 포함하고, 상기 탄소계 입자는 rGO(reduced graphene oxide) 입자, GNP(graphene nano platelet) 입자 또는 이들이 혼합된 입자이고, 상기 폴리머 비드는 PBMA(Poly(butyl methylacrylate), PMMA(polymethyl methacrylate) 및 PMSQ(Polymethyl silsesquioxane)로 이루어지는 군에서 선택되는 일종 이상인 차광필름용 조성물을 제공할 수 있다.