RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

The present invention relates to a resist topcoat composition comprising an acrylic polymer containing a structural unit containing a hydroxyl group and fluorine; at least one of an amine compound containing at least one nitrogen and a heterocyclic compound containing at least one nitrogen; and a so...

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Bibliographische Detailangaben
Hauptverfasser: CHUN MINKI, KWON SOONHYUNG, BAE SHINHYO, KIM SEONGJIN, CHO AHRA, BAEK JAEYEOL, PARK HYEON, KIM MINSOO, JIN HWAYOUNG, NAMGUNG RAN, CHOI YOOJEONG, SONG DAESEOK
Format: Patent
Sprache:eng ; kor
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