감광 코팅의 노출을 위한 방법 및 장치

본 발명은 감광 코팅의 노출을 위한 방법 및 장치에 관한 것이다. The invention relates to a method and a device for the exposure of a photosensitive coating.

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Bibliographische Detailangaben
Hauptverfasser:	THALLNER BERNHARD, ZENGER TOBIAS, POVAZAY BORIS, UHRMANN THOMAS
Format:	Patent
Sprache:	kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	본 발명은 감광 코팅의 노출을 위한 방법 및 장치에 관한 것이다. The invention relates to a method and a device for the exposure of a photosensitive coating.