ELECTROSTATIC DISCHARGE PROTECTION CELL AND ANTENNA INTEGRATED WITH THROUGH SILICON VIA
Disclosed is a semiconductor device comprising: a through-silicon via (TSV) disposed in a TSV region of a substrate to extend through the substrate; an ESD cell adjacent to a first end portion of the TSV to come in contact with the TSV region, wherein the ESD cell includes a set of diodes electrical...
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Format: | Patent |
Sprache: | eng ; kor |
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