ELECTROSTATIC DISCHARGE PROTECTION CELL AND ANTENNA INTEGRATED WITH THROUGH SILICON VIA

Disclosed is a semiconductor device comprising: a through-silicon via (TSV) disposed in a TSV region of a substrate to extend through the substrate; an ESD cell adjacent to a first end portion of the TSV to come in contact with the TSV region, wherein the ESD cell includes a set of diodes electrical...

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Bibliographische Detailangaben
Hauptverfasser: YU HO CHE, WANG XINYONG, CHEN CHIH LIANG, CHANG TZU HENG, CHANG FONG YUAN
Format: Patent
Sprache:eng ; kor
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