SUBSTRATE CLEANING LINE AND SUBSTRATE CLEANING SYSTEM COMPRISING THE SAME
A substrate cleaning line and a substrate cleaning system including the same are disclosed. The substrate cleaning line according to one embodiment includes: a chamber unit including a plurality of cleaning chambers for cleaning a substrate; and a first transfer robot carrying in, unloading, or tran...
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| creator | YUN GEUN SIK CHAE HEE SUNG LEE SEUNG EUN |
| description | A substrate cleaning line and a substrate cleaning system including the same are disclosed. The substrate cleaning line according to one embodiment includes: a chamber unit including a plurality of cleaning chambers for cleaning a substrate; and a first transfer robot carrying in, unloading, or transferring the substrate to the plurality of cleaning chambers. Each of the plurality of cleaning chambers may be vertically stacked.
기판 세정 라인 및 이를 포함하는 기판 세정 시스템일 개시한다. 일 실시 예에 따른 기판 세정 라인은, 기판을 세정하기 위한 복수 개의 세정 챔버를 포함하는 챔버부; 및 상기 복수 개의 세정 챔버에 대하여 상기 기판을 반입, 반출 또는 이송하는 제1 반송 로봇을 포함하고, 상기 복수 개의 세정 챔버는 각각 수직 방향으로 적층 될 수 있다. |
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기판 세정 라인 및 이를 포함하는 기판 세정 시스템일 개시한다. 일 실시 예에 따른 기판 세정 라인은, 기판을 세정하기 위한 복수 개의 세정 챔버를 포함하는 챔버부; 및 상기 복수 개의 세정 챔버에 대하여 상기 기판을 반입, 반출 또는 이송하는 제1 반송 로봇을 포함하고, 상기 복수 개의 세정 챔버는 각각 수직 방향으로 적층 될 수 있다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230303&DB=EPODOC&CC=KR&NR=20230029443A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230303&DB=EPODOC&CC=KR&NR=20230029443A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YUN GEUN SIK</creatorcontrib><creatorcontrib>CHAE HEE SUNG</creatorcontrib><creatorcontrib>LEE SEUNG EUN</creatorcontrib><title>SUBSTRATE CLEANING LINE AND SUBSTRATE CLEANING SYSTEM COMPRISING THE SAME</title><description>A substrate cleaning line and a substrate cleaning system including the same are disclosed. The substrate cleaning line according to one embodiment includes: a chamber unit including a plurality of cleaning chambers for cleaning a substrate; and a first transfer robot carrying in, unloading, or transferring the substrate to the plurality of cleaning chambers. Each of the plurality of cleaning chambers may be vertically stacked.
기판 세정 라인 및 이를 포함하는 기판 세정 시스템일 개시한다. 일 실시 예에 따른 기판 세정 라인은, 기판을 세정하기 위한 복수 개의 세정 챔버를 포함하는 챔버부; 및 상기 복수 개의 세정 챔버에 대하여 상기 기판을 반입, 반출 또는 이송하는 제1 반송 로봇을 포함하고, 상기 복수 개의 세정 챔버는 각각 수직 방향으로 적층 될 수 있다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPAMDnUKDglyDHFVcPZxdfTz9HNX8PH0c1Vw9HNRwCIXHBkc4uqr4OzvGxDkGQwSCfFwVQh29HXlYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXx3kFGBkbGBgZGliYmxo7GxKkCAPCGLgQ</recordid><startdate>20230303</startdate><enddate>20230303</enddate><creator>YUN GEUN SIK</creator><creator>CHAE HEE SUNG</creator><creator>LEE SEUNG EUN</creator><scope>EVB</scope></search><sort><creationdate>20230303</creationdate><title>SUBSTRATE CLEANING LINE AND SUBSTRATE CLEANING SYSTEM COMPRISING THE SAME</title><author>YUN GEUN SIK ; CHAE HEE SUNG ; LEE SEUNG EUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230029443A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>YUN GEUN SIK</creatorcontrib><creatorcontrib>CHAE HEE SUNG</creatorcontrib><creatorcontrib>LEE SEUNG EUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YUN GEUN SIK</au><au>CHAE HEE SUNG</au><au>LEE SEUNG EUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE CLEANING LINE AND SUBSTRATE CLEANING SYSTEM COMPRISING THE SAME</title><date>2023-03-03</date><risdate>2023</risdate><abstract>A substrate cleaning line and a substrate cleaning system including the same are disclosed. The substrate cleaning line according to one embodiment includes: a chamber unit including a plurality of cleaning chambers for cleaning a substrate; and a first transfer robot carrying in, unloading, or transferring the substrate to the plurality of cleaning chambers. Each of the plurality of cleaning chambers may be vertically stacked.
기판 세정 라인 및 이를 포함하는 기판 세정 시스템일 개시한다. 일 실시 예에 따른 기판 세정 라인은, 기판을 세정하기 위한 복수 개의 세정 챔버를 포함하는 챔버부; 및 상기 복수 개의 세정 챔버에 대하여 상기 기판을 반입, 반출 또는 이송하는 제1 반송 로봇을 포함하고, 상기 복수 개의 세정 챔버는 각각 수직 방향으로 적층 될 수 있다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | SUBSTRATE CLEANING LINE AND SUBSTRATE CLEANING SYSTEM COMPRISING THE SAME |
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