TREATING LIQUID SPRAY APPARATUS

Disclosed is a treatment liquid spray apparatus. The treatment liquid spray apparatus of the present invention includes: a swing head part swingably installed about a first axis; a tilting arm part connected to the swing head to be tilted and rotated around a second axis; a treatment liquid supply p...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	BAEK SEUNG DAE, KIM SUNG YUP
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY NOZZLES PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	Disclosed is a treatment liquid spray apparatus. The treatment liquid spray apparatus of the present invention includes: a swing head part swingably installed about a first axis; a tilting arm part connected to the swing head to be tilted and rotated around a second axis; a treatment liquid supply part installed in the swing head part and the tilting arm part; a spray nozzle part connected to the treatment liquid supply part and installed in the swing head part to spray the treatment liquid supplied from the treatment liquid supply part; and a tilting driving part connected to the tilting arm part to tilt and rotate the tilting arm part. Therefore, it is possible to improve the removal efficiency of foreign substances in a wafer part 처리액 분사장치에 대한 발명이 개시된다. 본 발명의 처리액 분사장치는: 제1축을 중심으로 스윙 가능하게 설치되는 스윙 헤드부; 제2축을 중심으로 틸팅 회전되도록 스윙 헤드부에 연결되는 틸팅암부; 스윙 헤드부와 틸팅암부에 설치되는 처리액 공급부; 처리액 공급부에 연결되고, 처리액 공급부에서 공급되는 처리액을 분사하도록 스윙 헤드부에 설치되는 분사노즐부; 및 틸팅암부를 틸팅 회전시키도록 틸팅암부에 연결되는 틸팅 구동부를 포함하는 것을 특징으로 한다.