Chamber for substrate processing apparatus for substrate processing including the same and method for substrate processing using the same

A substrate processing chamber is provided. The substrate processing chamber includes: a housing providing a process space; a spin device within the housing; and a fluid spray nozzle spraying a fluid into the process space. The spin device includes: a spin chuck supporting a substrate; a rotation dr...

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Bibliographische Detailangaben
Hauptverfasser:	BAEK SEUNGBU, RYU JAE SEONG, KO HYUNJIN, JUN YONGMYUNG, KIM SEOHYUN, BAE INKWANG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHAMBERS PROVIDED WITH MANIPULATION DEVICES CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HAND TOOLS MANIPULATORS MEASURING PERFORMING OPERATIONS PHYSICS PORTABLE POWER-DRIVEN TOOLS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TESTING TRANSPORTING WEIGHING
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