Chamber for substrate processing apparatus for substrate processing including the same and method for substrate processing using the same

A substrate processing chamber is provided. The substrate processing chamber includes: a housing providing a process space; a spin device within the housing; and a fluid spray nozzle spraying a fluid into the process space. The spin device includes: a spin chuck supporting a substrate; a rotation dr...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	BAEK SEUNGBU, RYU JAE SEONG, KO HYUNJIN, JUN YONGMYUNG, KIM SEOHYUN, BAE INKWANG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CHAMBERS PROVIDED WITH MANIPULATION DEVICES CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HAND TOOLS MANIPULATORS MEASURING PERFORMING OPERATIONS PHYSICS PORTABLE POWER-DRIVEN TOOLS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TESTING TRANSPORTING WEIGHING
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Beschreibung
Zusammenfassung:	A substrate processing chamber is provided. The substrate processing chamber includes: a housing providing a process space; a spin device within the housing; and a fluid spray nozzle spraying a fluid into the process space. The spin device includes: a spin chuck supporting a substrate; a rotation driving part rotating the spin chuck; and a weight sensor detecting the weight of the substrate placed on the spin chuck. It is possible to provide a substrate processing chamber for checking the amount of wetting. 공정 공간을 제공하는 하우징; 상기 하우징 내의 스핀 장치; 및 상기 공정 공간에 유체를 분사하는 유체 분사 노즐; 을 포함하되, 상기 스핀 장치는: 기판을 지지하는 스핀 척; 상기 스핀 척을 회전시키는 회전 구동부; 및 상기 스핀 척 상에 배치되는 기판의 무게를 감지하는 무게 감지 센서; 를 포함하는 기판 처리 챔버가 제공된다.