RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

The present invention relates to a resist underlayer composition comprising a polymer including a main chain, a side chain, or a main chain and a side chain of a heterocycle containing two or more nitrogen atoms in a ring, a compound including a moiety represented by a chemical formula 1 below, and...

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Bibliographische Detailangaben
Hauptverfasser:	KWON SOONHYUNG, KIM SEONGJIN, BAEK JAEYEOL, KIM MINSOO, PARK HYEON, JIN HWAYOUNG, CHOI YOOJEONG, NAMGUNG RAN, SONG DAESEOK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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