High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method
A method for manufacturing a high-temperature and low-friction multi-component thin film to which vanadium is added according to the present invention comprises: a step (a) of laminating an adhesion coating layer containing a Cr component on the surface of a target base material; a step (b) of lamin...
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| creator | HO SUNGBO KIM WANG RYEOL PARK IN WOOK PARK CHAN HYEOK KIM JUN HO |
| description | A method for manufacturing a high-temperature and low-friction multi-component thin film to which vanadium is added according to the present invention comprises: a step (a) of laminating an adhesion coating layer containing a Cr component on the surface of a target base material; a step (b) of laminating, on the adhesion coating layer, an intermediate coating layer containing Cr and Al components and having a number of constituent elements equal to or greater than the number of constituent elements constituting the adhesion coating layer; and a step (c) of laminating, on the intermediate coating layer, a final coating layer containing Cr, Al, and V components and having a number of constituent elements equal to or greater than the number of constituent elements constituting the intermediate coating layer.
본 발명에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법은, 대상 모재의 표면에, Cr 성분을 포함하는 밀착 코팅층을 적층하는 (a)단계, 상기 밀착 코팅층 상에, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층을 적층하는 (b)단계 및 상기 중간 코팅층 상에, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층을 적층하는 (c)단계를 포함한다. |
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본 발명에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법은, 대상 모재의 표면에, Cr 성분을 포함하는 밀착 코팅층을 적층하는 (a)단계, 상기 밀착 코팅층 상에, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층을 적층하는 (b)단계 및 상기 중간 코팅층 상에, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층을 적층하는 (c)단계를 포함한다.</description><language>eng ; kor</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230130&DB=EPODOC&CC=KR&NR=20230014396A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230130&DB=EPODOC&CC=KR&NR=20230014396A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HO SUNGBO</creatorcontrib><creatorcontrib>KIM WANG RYEOL</creatorcontrib><creatorcontrib>PARK IN WOOK</creatorcontrib><creatorcontrib>PARK CHAN HYEOK</creatorcontrib><creatorcontrib>KIM JUN HO</creatorcontrib><title>High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method</title><description>A method for manufacturing a high-temperature and low-friction multi-component thin film to which vanadium is added according to the present invention comprises: a step (a) of laminating an adhesion coating layer containing a Cr component on the surface of a target base material; a step (b) of laminating, on the adhesion coating layer, an intermediate coating layer containing Cr and Al components and having a number of constituent elements equal to or greater than the number of constituent elements constituting the adhesion coating layer; and a step (c) of laminating, on the intermediate coating layer, a final coating layer containing Cr, Al, and V components and having a number of constituent elements equal to or greater than the number of constituent elements constituting the intermediate coating layer.
본 발명에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법은, 대상 모재의 표면에, Cr 성분을 포함하는 밀착 코팅층을 적층하는 (a)단계, 상기 밀착 코팅층 상에, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층을 적층하는 (b)단계 및 상기 중간 코팅층 상에, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층을 적층하는 (c)단계를 포함한다.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjDEKwkAQANNYiPqHBetANCJYSjAoaiNBS1nu1txCshfu9vABflwRH2A1zcyMs9eeWwcN9QMF1BQIUCyc_BPqwEbZC1QOAxqlwFHZRDinTjmvfD94IVFoHAvU3PWgHm6OjYMrClpOPXCErbVkv9eDfmKU9PjcUmBp4UzqvJ1mowd2kWY_TrJ5vWuqfU6Dv1Mc0JCQ3o-XZbEsi2KxKjfrbfmf9QamLUoG</recordid><startdate>20230130</startdate><enddate>20230130</enddate><creator>HO SUNGBO</creator><creator>KIM WANG RYEOL</creator><creator>PARK IN WOOK</creator><creator>PARK CHAN HYEOK</creator><creator>KIM JUN HO</creator><scope>EVB</scope></search><sort><creationdate>20230130</creationdate><title>High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method</title><author>HO SUNGBO ; KIM WANG RYEOL ; PARK IN WOOK ; PARK CHAN HYEOK ; KIM JUN HO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20230014396A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2023</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>HO SUNGBO</creatorcontrib><creatorcontrib>KIM WANG RYEOL</creatorcontrib><creatorcontrib>PARK IN WOOK</creatorcontrib><creatorcontrib>PARK CHAN HYEOK</creatorcontrib><creatorcontrib>KIM JUN HO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HO SUNGBO</au><au>KIM WANG RYEOL</au><au>PARK IN WOOK</au><au>PARK CHAN HYEOK</au><au>KIM JUN HO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method</title><date>2023-01-30</date><risdate>2023</risdate><abstract>A method for manufacturing a high-temperature and low-friction multi-component thin film to which vanadium is added according to the present invention comprises: a step (a) of laminating an adhesion coating layer containing a Cr component on the surface of a target base material; a step (b) of laminating, on the adhesion coating layer, an intermediate coating layer containing Cr and Al components and having a number of constituent elements equal to or greater than the number of constituent elements constituting the adhesion coating layer; and a step (c) of laminating, on the intermediate coating layer, a final coating layer containing Cr, Al, and V components and having a number of constituent elements equal to or greater than the number of constituent elements constituting the intermediate coating layer.
본 발명에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법은, 대상 모재의 표면에, Cr 성분을 포함하는 밀착 코팅층을 적층하는 (a)단계, 상기 밀착 코팅층 상에, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층을 적층하는 (b)단계 및 상기 중간 코팅층 상에, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층을 적층하는 (c)단계를 포함한다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method |
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