High Temperature and Low Friction Characteristics Multi-Component Thin Film to Which Vanadium is Added and Its Manufacturing Method

A method for manufacturing a high-temperature and low-friction multi-component thin film to which vanadium is added according to the present invention comprises: a step (a) of laminating an adhesion coating layer containing a Cr component on the surface of a target base material; a step (b) of lamin...

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Bibliographische Detailangaben
Hauptverfasser: HO SUNGBO, KIM WANG RYEOL, PARK IN WOOK, PARK CHAN HYEOK, KIM JUN HO
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:A method for manufacturing a high-temperature and low-friction multi-component thin film to which vanadium is added according to the present invention comprises: a step (a) of laminating an adhesion coating layer containing a Cr component on the surface of a target base material; a step (b) of laminating, on the adhesion coating layer, an intermediate coating layer containing Cr and Al components and having a number of constituent elements equal to or greater than the number of constituent elements constituting the adhesion coating layer; and a step (c) of laminating, on the intermediate coating layer, a final coating layer containing Cr, Al, and V components and having a number of constituent elements equal to or greater than the number of constituent elements constituting the intermediate coating layer. 본 발명에 따른 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 제조방법은, 대상 모재의 표면에, Cr 성분을 포함하는 밀착 코팅층을 적층하는 (a)단계, 상기 밀착 코팅층 상에, Cr 성분 및 Al 성분을 포함하되, 상기 밀착 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 중간 코팅층을 적층하는 (b)단계 및 상기 중간 코팅층 상에, Cr 성분, Al 성분 및 V 성분을 포함하되, 상기 중간 코팅층을 구성하는 구성 원소 개수 이상의 구성 원소 개수를 가지는 최종 코팅층을 적층하는 (c)단계를 포함한다.