Flow control apparatus

The present invention relates to a flow control apparatus used in a semiconductor process field and, more particularly, to a flow control apparatus that The device can smoothly amplify the speed of a fluid flowing into a moving part by a Coanda effect, and is easy to manufacture and maintain, by for...

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Bibliographische Detailangaben
Hauptverfasser:	KWEN CHANG GU, KIM HYUN SIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOWOF GASES OR LIQUIDS FLUID-PRESSURE ACTUATORS HEATING HYDRAULICS OR PNEUMATICS IN GENERAL LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS
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Beschreibung
Zusammenfassung:	The present invention relates to a flow control apparatus used in a semiconductor process field and, more particularly, to a flow control apparatus that The device can smoothly amplify the speed of a fluid flowing into a moving part by a Coanda effect, and is easy to manufacture and maintain, by forming a stable flow pressure and flow of a supply fluid flowing inside the flow control apparatus. The flow control apparatus comprises a first body, a second body, and a third body. 본 발명은 반도체 공정 분야에서 사용되는 유량 제어 장치에 관한 것으로서, 특히, 유량 제어 장치 내부에서 유동하는 공급 유체의 안정된 유동압 및 흐름을 형성함으로써, 유동부로 유입되는 유체의 속도를 코안다 효과로 원활하게 증폭시킬 수 있고, 제조 및 유지 보수가 용이한 유량 제어 장치에 관한 것이다.