Evaporation Coating thickness Uniformity Control System

An objective of the present invention is to maintain uniformity of a thin film when a long-term process in a mass production line causes a change in material flux by providing a remote-controlled material flux calibration plate that can calibrate material flux without stopping line operation, while...

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Bibliographische Detailangaben
Hauptverfasser:	HONG YE WON, LEE ONE HEE, JEONG YONG CHAN, KIM JINSU, CHO KYU JOONG, KIM NAMYEON, KIM DONG YOUNG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	An objective of the present invention is to maintain uniformity of a thin film when a long-term process in a mass production line causes a change in material flux by providing a remote-controlled material flux calibration plate that can calibrate material flux without stopping line operation, while performing a continuous process for a long time. According to the above objective, the present invention constitutes a driving unit capable of remotely driving forward and backward on a correction plate disposed above an evaporation source nozzle. 본 발명의 목적은 양산 라인에서 장시간 공정이 진행되어 물질 플럭스에 변화가 생길 경우, 라인 운영을 중단하지 않고 물질 플럭스를 보정 할 수 있는 원격 제어형 물질 플럭스 보정판을 제공하여, 장시간 연속공정을 진행하면서도 박막 균일성을 유지하도록 하는 것이다. 상기 목적에 따라 본 발명은 증착원 노즐 상부에 배치되는 보정판에 원격으로 전후진 구동될 수 있는 구동부를 구성한다.