Sealing unit and Substrate processing apparatus having the same

The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus that performs a processing process on a substrate using a supercritical fluid. The substrate processing apparatus prevents damage to a sealing unit for sealing a chamber, ext...

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Bibliographische Detailangaben
Hauptverfasser:	JU JUNG MYOUNG, PARK BYUNG WOOK, LEE JOON HEE, KO KWANG HUN, KIM YEONG BEEN, OH SEUNG MIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS
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Beschreibung
Zusammenfassung:	The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus that performs a processing process on a substrate using a supercritical fluid. The substrate processing apparatus prevents damage to a sealing unit for sealing a chamber, extends its lifespan and prevents the inflow of particles. 본 발명은 기판처리장치에 대한 것으로서, 상세하게는 초임계유체를 이용하여 기판에 대한 처리공정을 수행하는 기판처리장치에 있어서 챔버를 밀폐시키는 실링유닛의 손상을 방지하여 수명을 연장시키고 파티클 유입을 억제할 수 있는 기판처리장치에 대한 것이다.