Substrate processing apparatus

The present invention relates to a substrate processing device. In detail, the substrate processing device for performing a processing process for a substrate using a supercritical fluid, a fluid port which supplies or discharges the supercritical fluid can suppress particle generation and maintain...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JU JUNG MYOUNG, PARK BYUNG WOOK, LEE JOON HEE, KO KWANG HUN, KIM YEONG BEEN, OH SEUNG MIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS
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Beschreibung
Zusammenfassung:	The present invention relates to a substrate processing device. In detail, the substrate processing device for performing a processing process for a substrate using a supercritical fluid, a fluid port which supplies or discharges the supercritical fluid can suppress particle generation and maintain airtightness. 본 발명은 기판처리장치에 대한 것으로서, 상세하게는 초임계유체를 이용하여 기판에 대한 처리공정을 수행하는 기판처리장치에 있어서 초임계유체를 공급하거나 배출하는 유체포트에서 파티클 발생을 억제하고 기밀을 유지할 수 있는 기판처리장치에 대한 것이다.