Apparatus for substrate drying apparatus for substrate processing including the same and method for substrate processing using the same

Provided is a substrate drying device, which includes: a drying chamber housing providing a drying space in which a substrate is disposed; a supercritical fluid supply unit supplying supercritical fluid to the drying space; a substrate heating unit heating the substrate disposed in the drying space;...

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Bibliographische Detailangaben
Hauptverfasser:	LEE KUNTACK, KIM YOUNG HOO, PARK SANGJINE, JEONG JIHOON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES WEAPONS
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Beschreibung
Zusammenfassung:	Provided is a substrate drying device, which includes: a drying chamber housing providing a drying space in which a substrate is disposed; a supercritical fluid supply unit supplying supercritical fluid to the drying space; a substrate heating unit heating the substrate disposed in the drying space; and a substrate cooling unit cooling the substrate disposed in the drying space. The substrate cooling unit includes: a cooling plate located under a place where a substrate is disposed; and a cooling passage inserted into the cooling plate. 기판이 배치되는 건조 공간을 제공하는 건조 챔버 하우징; 상기 건조 공간에 초임계 유체를 공급하는 초임계 유체 공급부; 상기 건조 공간에 배치된 기판을 가열하는 기판 가열부; 및 상기 건조 공간에 배치된 기판을 냉각하는 기판 냉각부를 포함하되, 상기 기판 냉각부는: 기판이 배치되는 곳의 하부에 위치하는 냉각 플레이트; 및 상기 냉각 플레이트 내에 삽입되는 냉각 유로를 포함하는 기판 건조 장치가 제공된다.