PATTERNING METHODS FOR SEMICONDUCTOR DEVICES AND STRUCTURES RESULTING THEREFROM

Provided are a semiconductor device and a method for forming a semiconductor device. The method includes the steps of: forming a first mask layer over a target layer; forming a plurality of spacers over the first mask layer; and forming a second mask layer over the plurality of spacers and patternin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PENG TAI YEN, CHEN WEN YEN, CHEN CHIH HAO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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