GAS PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

The present invention is to reduce the usage-amount of a solution. A gas processing apparatus comprises a duct, a partition plate, and a liquid supply part. The duct has a flow path through which gas passes. The partition plate is a partition plate that partitions the flow path into a plurality of s...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	AOKI DAISUKE, TSUGAO KEISUKE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SEPARATION TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention is to reduce the usage-amount of a solution. A gas processing apparatus comprises a duct, a partition plate, and a liquid supply part. The duct has a flow path through which gas passes. The partition plate is a partition plate that partitions the flow path into a plurality of spaces, and is made of a porous material capable of permeating gas and retaining liquid. The liquid supply part supplies a solution capable of dissolving a target component contained in the gas to the partition plate. Then, the gas processing apparatus causes the gas passing through the flow path to be in contact with the solution kept in the partition plate. 용해액의 사용량을 삭감하는 것이다. 기체 처리 장치는 덕트와, 구획판과, 액 공급부를 구비한다. 덕트는, 기체가 통과하는 유로를 내부에 가진다. 구획판은, 유로를 복수의 공간으로 구획하는 구획판으로서, 기체를 투과 가능하며 또한 액체를 유지 가능한 다공질재로 형성된다. 액 공급부는, 구획판에 기체에 포함되는 대상 성분을 용해 가능한 용해액을 공급한다. 그리고, 기체 처리 장치는, 구획판에 유지된 용해액에 유로를 통과하는 기체를 접촉시킨다.