Plasma resistant glass parts at chamber inside for semiconductor manufacturing process and manufacturing method thereof

The present invention relates to plasma resistant glass, parts for the inside of a chamber for a semiconductor manufacturing process, and a manufacturing method thereof. More specifically, the present invention relates to: a plasma resistant glass that can prevent damage from thermal shock when used...

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Bibliographische Detailangaben
Hauptverfasser:	KIM DAE GUN, LEE KYUNG MIN, NA HYE IN, LEE MUN KI, SEOK HYE WON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	The present invention relates to plasma resistant glass, parts for the inside of a chamber for a semiconductor manufacturing process, and a manufacturing method thereof. More specifically, the present invention relates to: a plasma resistant glass that can prevent damage from thermal shock when used at high temperatures by reducing the thermal expansion coefficient by adjusting the component content of the plasma-resistant glass; and a manufacturing method thereof. 본 발명은 내플라즈마 유리, 반도체 제조 공정을 위한 챔버 내부용 부품 및 그들의 제조방법에 관한 것으로, 구체적으로 내플라즈마 유리의 성분 함량을 조절하여 열팽창계수를 감소시켜 고온 사용시 열충격에 손상을 방지할 수 있는 내플라즈마 유리 및 그 제조 방법에 관한 것이다.